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Yeog Son
Department of Applied Physics, University of Kyung Hee, South Africa
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Mini Review
A Note on Fabrication of Nano Mold for Nanoimprint Lithography
Author(s): Yeog Son*
In order to create inversed patterns, nanoimprint lithography applies nanomolds to resists. It may be used to quickly and cheaply produce high resolution nanopatterns on both curved and flat surfaces. The quality of the nanoimprinted features depends on how faithfully the manufactured master nanopatterns and elastomer nanomolds are made. Despite extensive study into two-dimensional nanoimprint lithography, nothing is known about three-dimensional master nanopatterns and nanomolds. Even fewer of them talked about the consistency of complete processes from the creation of the original master to the final nanoimprinting. With the help of an atomic force microscope (AFM) and ultrasonic vibration assisted nanomachining, we were able to create three-dimensional master nanopatterns with intricate curves and constant height changes, as we showed in this paper. Using nanom.. View more»