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Dr. Katelin Forns
Department of Nanolithography, University WP Science and technology, Argentina
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Mini Review
Nanolithography: Techniques are used in Nanolithography
Author(s): Dr. Katelin Forns*
Nanolithography is the process of creating nanoscale patterns or structures on a substrate using various techniques such as electron beam lithography, scanning probe microscopy, and nanoimprint lithography. It has become an important tool in nanotechnology research and development due to its ability to fabricate complex structures with precise control over feature size, shape, and placement. Electron beam lithography (EBL) is one of the most commonly used techniques in nanolithography. It involves the use of a focused beam of electrons to create patterns on a substrate coated with a resist material. The resist material is selectively exposed to the electron beam, which causes a chemical change that allows for the creation of high-resolution patterns with feature sizes as small as a few nanometers. Scanning probe microscopy (SPM) is another popular technique in nanolithography. It invo.. View more»