Sung-Jin Kim
Accepted Abstracts: J Nanomed Nanotechnol
Holographic three dimensional (3D) lithography is a process to create a 3D structure on a sample substrate by the aid of hologram. The conventional fabrication process such as direct laser beam writing or gray-tone lithography can be used to create one of a kind hologram and multilevel or continuous-level computer generated holograms. Especially, it has been shown that optical gratings can be encoded on the sample surface by two beam interference of a single near infrared femtosecond laser pulse. In general, diffraction gratings were fabricated on optical materials such as silver-halide emulsion, photoresist, and photopolymer. In this work, fabrication of nano-scale holographic gratings on Al 2 O 3 surface using femtosecond laser pulse was demonstrated. Holographic gratings fabrication using two beams interference method on Al 2 O3 which deposited using ALD device has never been reported. With holographic gratings method, either fabrication time or fabrication cost will be reduced. Moreover, this type of diffraction gratings can be applied for power magnification of the ultra-short laser system
Sung-Jin Kim received the Ph.D. degree in the School of Electrical and Computer Engineering from Seoul National University, Seoul, Korea, in 2006. In, 2007, he was a Postdoctoral Research Scientist with the Department of Electrical Engineering, Columbia University, New York, NY, where he was initially engaged in research on the application of nano technology and new processing strategies for highly integrated systems. In 2008, he joined the School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA, as a Postdoctoral Fellow working on solution-processable nano structured devices. His current research interests include the nanodevices, flexible nanoprinting electronics, and energy harvesting nano applications.